Metal Impurities in Silicon-Device Fabrication

Metal Impurities in Silicon-Device Fabrication

Dr. Klaus Graff (auth.)
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Metal Impurities in Silicon-Device Fabrication treats the transition-metal impurities generated during silicon sample and device fabrication. The different mechanisms responsible for contamination are discussed, and a survey given of their impact on device performance. The specific properties of main and rare impurities in silicon are examined, as well as the detection methods and requirements in modern technology. Finally, impurity gettering is studied along with modern techniques to determine gettering efficiency. In all of these subjects, reliable and up-to-date data are presented. The monograph provides a thorough review of the results of recent scientific investigations, as well as of the relevant data and properties of the various metal impurities in silicon.
Категории:
Год:
1995
Издательство:
Springer Berlin Heidelberg
Язык:
english
Страницы:
227
ISBN 10:
364297595X
ISBN 13:
9783642975950
Серия:
Springer Series in Materials Science 24
Файл:
PDF, 6.60 MB
IPFS:
CID , CID Blake2b
english, 1995
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